Extremely high resolution state-of-the-art resists for sub-0.12µm geometries in 193nm and 248nm technology through i-line, g-line and broadband photoresists including rubber based negative technologies. We also offer a photoresist system known as TIS 2000TM for 248nm and 193nm exposure wavelengths.
Specialty coatings used as a protective layer or "buffer coat" before packaging. Specifically engineered for Fabs running amine sensitive processes, the aqueous developable Durimide 9000 series material offers opportunity for developer consolidation within the Fab.
A comprehensive range of specialty etchants, cleaners, removers and other
ancillary products designed to compliment the FUJIFILM Electronic Materials
photoresist and polyimide product lines.
Thin Films Systems
A full range of ultra-pure CVD and diffusion chemicals as well as high purity
delivery systems designed to provide cost saving turn-key “system solutions” and next generation technologies to the semiconductor industry. The Thin Film Systems group is dedicated to being the prominent source of value to OEMs and end users.
The FUJIFILM Electronic Materials Color Mosaic® technology is a photosensitive-pigmented material used to produce the color filter array which is incorporated in liquid crystal displays (LCDs) and Image Sensors (ISs). The technology is used worldwide by display manufacturers to produce the red, green and blue color pixels found in leading-edge display products. The Color Mosaic® technology produces a color filter with high transparency and colorimetric purity.